Leakage Control of DRAM High-k Capacitor Stack by Ald Sc₂O₃, Y₂O₃ Inter-Layer

ALD Deposited IGO with High Thermal Stability (~ 800 ^oC) by Controlling Crystallinity for Multi-bit Operation 2T0C DRAM

Improving Electrical Properties of ZrO₂ Dielectric Films Without Sacrificing Tetragonal Crystallinity via Gd Doping

Area Selective Co ALD for Highly Reliable ULSI Interconnect System and the Establishment of ALD Process Design Framework

Atomic Layer Deposition (ALD) of Transition Metal Dichalcogenides (TMDS) Layers as Metal Diffusion Barriers for Back-End-of-Line (BEOL) Applications

High-Quality Co Thin Film by Thermal ALD Using CCTBA Precursor by Controlling H₂ Dose

Improved Properties of Atomic Layer Deposited Ru Films by Providing Additional Reactant for Cu Alternative Interconnects

ALD Layers and Interfaces in Next Generation Photovoltaics

Utilizing Low-Temperature Ald Technique to Investigate Perovskite Nickelates for Photovoltaic Applications

Atomic Layer Deposition of Defect-Engineered TiO_x and TaO_x Protective Coatings for Photoelectrochemistry

Influence of Atomic Layer Deposition Tin Oxide Properties on the Performance of Perovskite Solar Cells

Navigating the Semiconductor Market for ALD Precursors - in the Past and in the Future

Improvement of COSMO-SAC Method for Estimating Vapor Pressure of ALD Precursors

Development of Precursors and Reactivity for Thermal Atomic Layer Deposition (ALD) of Main Group Elements

A New ALD Process for Elemental Tellurium

Development of an Innovative Method to Find New Efficient Gallium ALD Precursors

Insights into Reactive Oxygen Species and Film Properties of Atomic Layer Deposited Al₂O₃ using Different Plasma-Activated Waters as Co-reactant

The Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Depositionof Oxides on Metal Surfaces

Atomic Layer Deposition of Co₂P Thin Films

Plasma-Enhanced ALD of Ga₂O₃ and Gan with Remote CCP-Plasma, Short Cycle Times, and Substrate Biasing

Y_xC Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier and Glue Layer for Cu & Ru Interconnects

Plasma Enhanced Atomic Layer Deposition of Boron Nitride

Time-Resolved Study of OH Radicals During PEALD of Al₂O₃ by Advanced Laser Spectroscopy

Engineering of Vo_x Properties Through Control of Plasma Characteristics During Plasma-Enhanced Atomic Layer Deposition

Current Status of ALE in Semiconductor Processes

ALE Preparation of Diamond Surfaces for Materials and Device Applications

Comparison of Different PEALE Modes on AlGaN/GaN Heterostructures

Quasi-ALE Process for GaN: High Etching Rate Without Compromising the Surface Roughness

A New Challenge for Developing Novel Atomic Layer Etching: Applying the Leidenfrost Effect to Obtain Floating Nanomist-Assisted Vapor Etching

Electron-Enhanced Etching of Molybdenum Using Sequential O₂ and HCl Reactive Background Gases to Form Volatile Molybdenum Oxychlorides

Impact of Activation Strategies for Sio₂ Atomic Layer Etching Applied to Contact Patterning

Thermal Etching of Metals and Metallic Materials for Gate-All-Around Devices

Low Temperature, Conversion-Free Thermal Atomic Layer Etching of Zinc Oxide using Hydrofluoric Acid and Trimethylgallium

Thermal Atomic Layer Etching of the Indium Gallium Zinc Oxide (IGZO) Family by Fluorination and Ligand-Substitution Hydrogen-Transfer Reactions

Designing an ALE Process and Uncovering the Etching Mechanism for a 2D van Der Waals Material: Ternary Transition Metal Chalcogenide CrPS₄

Development of a Modular Manufacturing Equipment Architecture for Application Tailored Process Options

Optimizing Precursor Utilization for Spatial ALD in High Surface Area Substrates

Development and Scale-up of ALD onto Synthetic Graphite Powder in a Continuous Vibrating Reactor for Battery Applications

Ultra High Speed Spatial PEALD Using a Novel Precursor Separation Method

An Innovative 3D Solution for High Throughput Roll-to-Roll ALD

A Novel Technique for Pulsed Liquid Source Vapor Delivery in ALD and Short-Pulse CVD

In-situ Spectroscopic Ellipsometry During Spatial ALD of Al₂O₃, ZnO, and SnO₂

Novel Carbon-based Ligands on Planar Metal Surfaces: Self Assembled Monolayers and Applications in Atomic Layer Deposition

Enhancing Selectivity for AS-ALD of MoO₂ through Hydrogen Treatment: Strategy of Surface Cleaning and Expanding Deactivated Areas

Contra-Selective Deposition of SiO₂ on Metals

Photoluminescent Graphene-Lanthanide Heterostructures via Direct Laser Writing and Area-Selective Atomic-Molecular Layer Deposition