ALD/ALE 2024 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details. Click a Session in the first column to view session papers.
Session | Wednesday, August 7, 2024 | |||||||||||||
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1:30 PM | 2:30 PM | 3:30 PM | ||||||||||||
AA1-WeA |
ALD Solutions for Compound Semiconductor Devices
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Plasma Effects on the Epitaxial Growth of Aluminum Nitride Thin Films on (0001)4H-SiC by PE-ALD
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Novel Low Temperature Thermal ALD of Aluminum Nitride Utilizing a Non-Metal Catalyst
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Thermal and Plasma Enhanced ALD growth of functional Al2O3/AlN dielectric stacks for silicon carbide MOSFETs
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Reduction of Defects at or Near ALD-Al2O3/GaN Interfaces for Improved Electrical Performance of GaN Power Devices
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Fabrication of RuS2 Photodetector Via Post Sulfurization of Atomic Layer Deposition Ru Thin Film
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Spatial Atomic Layer Deposition: A New Revolution in Ultra-Fast Production of Conformal and High-Quality Optical Coatings
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Break
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AA2-WeA |
Deposition and Characterization of Electro-Optic ALD K(TaX,Nb1-X)O3 Films for Photonics
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Advances in Plasma-based Atomic Layer Processing of AlF3 for the Passivation of FUV Mirrors
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Plasma-Enhanced Atomic Layer Deposition with RF Substrate Biasing to Tune the Performance of Superconducting Nanowire Single-Photon Detectors in the Mid-Infrared
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AA3-WeA |
Atomic Layer Deposition for Stable On-Chip Quantum Dot LEDs: Hybrid Quantum Dot Pockets
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A Comparative Study on Cation distribution effects in Heterogeneous channel IGZO TFTs via Atomic Layer Deposition Supercycle Design
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Characteristics of PEALD IGZO Films Using Tetrahydrofuran-Adducted In & Ga Precursors
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AF1-WeA |
Triggering Nucleation of Pt ALD through UV-illumination
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Reaction Pathway of Copper Atomic Layer Deposition via Time-of-Flight Mass Spectrometry
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in vacuo Cluster Tool for Studying Reaction Mechanisms in ALD and ALE Processes
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Understanding the Dual-Source Behavior of LiHMDS for Si-Free Li-Containing Films
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Combining in Situ Photoluminescence and Ellipsometry : A New Approach to Analyse and Optimize Ald Materials for Photovoltaic Applications
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Self-Limiting Deposition of Copper from Copper Beta-Diketonates and Plasma Electrons
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Exploring Nucleation Phenomena in Ultra-Thin ALD and PE-Ald Films on NMC 811 Substrates: An in Situ Quartz Crystal Microbalance Study
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The Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2-Plasma
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Break
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AF2-WeA |
In vacuo XPS Growth Studies During ALD of ErNiO3
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Surface Chemistry of Aluminum Nitride ALD
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Investigating Hf Oxide Growth with Ambient Pressure XPS and Ozone as Co-Reactant
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ALD/ALE 2024 Closing Remarks
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AF3-WeA |
UHP PEALD Growth and High Field Dielectric Testing of κ-Ga2O3 Films
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Crystalline Phase Control of Manganese Oxide Films by Plasma Enhanced Atomic Layer Deposition
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Superconducting Ultrathin Niobium Nitride Films for Quantum Application
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ALE-WeA |
Modeling of Plasma-Assisted Cryogenic Etching of SiO2
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Utilizing Thermodynamic Analysis to Screen Material and Precursor Selection for Selective Thermal Atomic Layer Etching
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Atomistic Surface Processing Simulations: ALE of Transition Metal Dichalcogenides
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Gas-Phase Etching Mechanism of Amorphous Hydrogenated Silicon Nitride by Hydrogen Fluoride: A Theoretical Study
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Dynamic Global Model of Cl2/Ar Plasmas for Atomic Layer Etching of GaN
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A Transient Surface Site Balance Model for Si-Cl2-Ar Atomic Layer Etching
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Theoretical Analysis on Halogenation of Transition Metal Surfaces toward Thermal Atomic Layer Etching
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Break
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EM-WeA |
Atomic-Scale Homogeneous PtRu Alloy Thin Films Prepared by Atomic Layer Modulation (ALM)
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A New Approach to the Synthesis of Nb@TiO2 Core-Shell Composite for Oxide Dispersion Strengthened Alloy via Atomic Layer Deposition
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Influence of an Artificial Structure on the Mechanical Properties of Atomic Layer Deposited Al2O3 and Ta2O5 Composite Thin Films
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Phosphorus-Rich Metal Phosphide Thin Films Using Zintl Ions
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Improved Crystallinity and Polarity Determination of Gallium Nitride on Si (111) Using Atomic Layer Annealing
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Self-limiting Epitaxy of GaN and InN Films on Sapphire Substrates
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Epitaxial Rare-Earth Orthoferrites by Atomic Layer Deposition
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Area Selectivity and Crystallographic Orientation of ZIF-8 Films Deposited by Molecular Layer Deposition
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Break
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