ALD/ALE 2024 Wednesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, August 7, 2024
8:00 AM 9:00 AM 10:00 AM 11:00 AM
AA1-WeM
Ferroelectric Doped HfO2: From Ald Processing to Device Applications
Interfacial Layer Engineering by Tungsten Oxide for Ferroelectric La-Doped Hf0.5Zr0.5O2 Layer
Performance Improvement of Hf0.45Zr0.55Ox Ferroelectric Field Effect Transistor Memory with Ultrathin Al–O Bonds-Modified InOx Channels
In-situ Crystallization of Ferroelectric Hf0.5Zr0.5O2 Thin Films with Record-high 2Pr (56μC/cm2) at Low Thermal Budget (300℃) Towards Full BEOL-compatibility
Enhancement of Ferroelectric Phase Formation of HfO2/ZrO2 Nanolaminate Films by Tuning HfO2 and ZrO2 Thicknesses Using Atomic Layer Deposition
Investigating the Impact of Process Parameters on the In-plane Strain of Ultra-Thin H­fxZr1-xO2 Films
Thermal ALD IGO Channel Layer with High-thermal Stability (> 800 oC) for New Hybrid (Poly-Si/IGO) Vertical 3D NAND Application
Break & Exhibits
AA2-WeM
Towards Neuromorphic Computing Using ALD Grown HfO2 Based Memristive Devices
Novel Carbon-Doped HfOx Memristor with Born-ON Characteristics Synthesized via ALD/MLD Combined Technique
Evolution of Structural Order in Doped Hafnia Thin Films by Atomic Layer Deposition for Emerging Device Applications
ALD HfZrO2 Films from Ferroelectric to High-k Applications
AA3-WeM
Tunable Superconducting NbxTi1-xN by Fast Plasma-enhanced ALD for Quantum Applications
Atomic Layer Deposited Metal Nitrides (TiN and InN) and Metal Semiconductor Heterojunctions for Quantum Applications
Ceramic Thin-Film Composite Membranes with Tunable Subnanometer Pores for Molecular Sieving by Atomic Layer Deposition
Recent Developments and Emerging Applications in Atmospheric-Pressure Atomic Layer Deposition of High-Porosity Materials
Atomic Layer Deposition of Self-Healing Protective Coatings for Stone Cultural Heritage Conservation
AF1-WeM
Conformality of Ternary Oxides by Spatial ALD: Monte Carlo Simulations and Experimental Study
Reusable Macroscopic HAR Test Kit Enabling Fast, Routine Characterization of Film Conformality
Superconformal ALD Using a Heavy Inert Diffusion Additive
Ald of Alumina-Silica Multilayers on Carbon Microfiber Fabrics: Microstructure and Potential as Refractory Oxygen Diffusion Barriers
Pillarhall Lateral High Aspect Ratio Assisted Unveiling of Secondary Growth Front and Background Reaction Mechanism in Atomic Layer Deposition
Helium Ion Microscopy on ALD Thin Films
Understanding the Amorphous Structure of Al- and Zn- Doped TiO2 with an Automated 4D-STEM Analysis Pipeline
Non-Destructive Characterization of ALD Thin Films Using Angle-resolved XPS and Structure Modeling
Break & Exhibits
AF2-WeM
Low-Temperature ALD of Metallic Cobalt for 3D Structures
Towards Deposition of Metallic Molybdenum Films from Molybdenum Hexacarbonyl in a Process Involving an Intermediate ALD Step and Subsequent Reduction
Growth of Metallic Ru Film by Oxidant-Free Atomic Layer Deposition Below 100 °C
Unveiling the Effect of the Starting Precursor on Ge2Sb2Te5 Atomic Layer Deposition
Atomic Layer Deposition Equipment Vendors Market and Technology
ALE1-WeM
Anisotropic and Isotropic Plasma-Enhanced Atomic Layer Etching Processes for Metals and Dielectric Materials for Semiconductor Devices
Transient Assisted Plasma Etching (TAPE)
Isotropic Plasma Atomic Layer Etching of Nickel Aluminide Binary Intermetallic Using a Super-Cycle Sequence Based on Hhfac and Al(CH3)3
Surface Effects in Quasi-ALE of Si: A Correlation with Ar+ Ion Energy
Atomic Layer Etching Study of Polycrystalline, Epitaxial and Doped ZnO Films Using in Situ Spectroscopic Ellipsometry
Atomic Layer Etching of Diamond for Epitaxy Preparation
Plasma Atomic Layer Etching of Titanium Nitride with Surface Fluorination or Chlorination and Ar Ion Bombardment
Break & Exhibits
ALE2-WeM
Interest and Potential of Atomic Layer Etching for Selective Deposition
Insight into SF6/H2 Plasma Mixtures to Expand the Capabilities of ALE
Retarding-Field Energy Analyzer as a Tool to Find the Process Window for Plasma-Assisted Atomic Layer Etching and Quasi-Atomic Layer Etching
EM-WeM
Resolving Composition and Crystal Structure of Fundamentally Novel MOF-Like Fe-Terephthalate Thin Films
Molecular Layer Deposition of Metal Organophosphonate Thin Films
Europium-Organic Luminescent Thin Films for Bioimiging Applications
Inverted Living Molecular Layer Deposition: An Empowering Technique for Biomedical Applications
Hybrid Multilayer EUV Photoresist with Vertical Molecular Wire Structure
Chemical Transformations Mediated by Low-Energy Electrons within Vapor Phase Synthesized Al-based Hybrid Thin Films for Advanced Resist Applications: An In-Situ Investigation
Molecular Layer Deposition of Phosphorus Thin Films Using Bis-α-aminophosphine Chemistry
Break & Exhibits
Sessions | Time Periods | Topics | Schedule Overview