ALD/ALE 2026 Tuesday Afternoon

Copper's Cosy Blanket: A Comparison of Non-Selective and Area-Selective ZnO deposition on Catalyst Stability

Effect of Buffer Layers on Cobalt-Based Thin-Film Catalysts for Fischer–Tropsch Synthesis

Preparing Well-defined CO₂-Conversion Catalysts using Atomic Layer Deposition

Palladium Nanostructures by ALD for Electrocatalysis: From Single Atoms to Nanoparticles

Controlling the Wettability and Durability of PEM Electrolysers with Plasma-Enhanced ALD of Niobium Nitride

ALD Imparts Efficiency Improvements in Proton Exchange Membrane Water Electrolyzers

Atomic Layer Deposition of Tantalum Oxide for enhanced stability of CNTs during Photoelectrochemical Water Splitting

Atomic Layer Deposited AZO on Lithium Niobate: A Scalable Platform for RF Energy Harvesting and Frequency Mixing

Fabricating Artificial Electrode Electrolyte Interfaces for Lithium Batteries

Beyond Conventional ALD: Investigating Standalone Chemical Vapor Transformation Precursors for Battery Cathode Functionalization

Tackling Issues of Transition Metal Oxide Cathodes Using Sulfide Coatings

Atomic Layer Deposition Tuned Surface Chemistry for Advanced Lithium and Manganese Rich Cathodes

Comparing Al-phosphate ALD on LiMn₂O₄ and SiO₂

Unravelling the Mechanism of Al₂O₃ Atomic Layer Deposition on Li₆PS₅Cl for All-Solid-State Batteries

Low Energy Ion Scattering Surface Analysis of ALD Coated Ti-Based Porous Transport Layers

In vacuo LEIS studies on cleaning and functionalizing substrate surfaces for ALD

ALD Outstanding Presentation Award Finalist: Operando Studies of Nitride ALD Using Ambient Pressure XPS

In-situ XPS Study of Ozone Oxidation of Aminosilane Adsorption Layers on Alumina

In situ and Operando investigation of MLD of Hafnicone Using Ambient Pressure-XPS

Pyroelectric Calorimetry of MgO and ZrO₂: Untangling Thermodynamics, Kinetics, and Precursor Transport

ALD Outstanding Presentation Award Finalist: Where Does the Reaction Happen? Concurrently Monitoring Ultrafast Surface and Gas-Phase Dynamics in Solid–Gas Interfacial Reactions

Dual-Box Model for In-Situ Spectroscopic Ellipsometry Data Analysis in Plasma Enhanced ALD Growth Processes

Imaging Ellipsometry with LHAR Test Structure for Characterizing ALD Conformality

Surface Chemistry Investigation for ALD of SiOCH Using in-Situ Reflection Absorption Infrared Spectroscopy (RAIRS)

Etch Characteristics of Iridium with Atomic Layer Etching Technique

Selectivity, Surface Roughness and Residue of Plasma-Based Atomic Layer Etching of Metals and Dielectric Materials for Semiconductor Devices

Directional Atomic Layer Etching of MgO-Doped Lithium Niobate Using Br-Based Plasma

Examining AlGaN Atomic Layer Etch per Cycle Uniformity and Repeatability by Cross-Referencing In-Situ Etch Depth Monitoring with Electrical Characterisation

Atomic Layer Etching Techniques for Sidewall Surface Damage Removal in GaN-Based LEDs

Self-Limiting Oxidation State Control of MoOx Thin Films Using Integrated ALD and ALE

Selective Etching of Molybdenum and Tungsten Oxides Based on Their Oxidation States Using SOCl₂ and SO₂Cl₂

High-Density Silicon Lines Patterning with Atomic Layer Etch Pitch Splitting (APS™) Technology

Direct Atomic Layer Processing (DALP®): Extending ALD and ALE to Spatially Localized Multi-Material Integration

Atomic Layer Etching of Titanium Nitride with O₃ and NbCl₅

Real-time Optimization of Gallium Oxide and Aluminum Gallium Oxide Thin Film Growth via Plasma-Enhanced Atomic Layer Deposition Using In-situ Spectroscopic Ellipsometry

Conductive Si-Doped Ga₂O₃ via Thermal ALD Followed by Thermal Annealing

Low-Temperature Self-Limiting Growth of Crystalline III-Nitride Films: How Far Can We Go?

Piezoelectric and ferroelectric Al_1-xSc_xN by plasma-enhanced ALD

Low Temperature PEALD of Epitaxial AlN Without Atomic Layer Annealing

Enabling Blister-Free, Crystalline AlN Thin Films on 200 mm Si Wafers by PE-ALD Using a Microwave Electron Cyclotron Resonance Plasma Source

ALD Synthesis of Transition Metal Phosphides

A Novel Chemistry toward the Atomic Layer Deposition of MoS2 thin films for Heterojunction Photocatalysis

The Role of Plasma Conditions on the Properties of MoS₂ Films Grown by PEALD Using H₂ plasma and Di-tert-butyl Disulfide

ALD-Induced Doping Effect in 2D MoS₂ FETs: Roles of Oxidant Chemistry and MoS₂ Quality

Processing MoS₂ and WS₂ using ALD and Patterning on 8-Inch Wafers

Exploiting Atomic Layer Deposition for Contacts to Semiconductors