ALD/ALE 2026 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, July 1, 2026
1:30 PM 2:30 PM 3:30 PM 4:30 PM
AA-WeA
Nanolaminate Bragg Reflectors for Acoustic Phonons in the > 100 Ghz Range
Next Generation ALD Functionalization of Lead-free MCPs for the Photomultiplier Tube: HRPPD
Growing Grass for the Stars: Conformal Nanostructured Ar Coatings for Astronomical Micro-Optics
Electrochemical Oxidation of Perfluorobutanoic Acid using ALD Thin Film Electrocatalysts Deposited on Reactive Electrochemical Membranes
Development of an Atomic Layer Deposition System for Tritium Permeation Barriers on Arbitrary Geometries
Argon Ion Implantation in ALD PbTe Thin Films for Phonon Engineering
Multifunctional Hierarchically Restructured Antibacterial Neural Interfacing Electrodes via Plasma-Enhanced Atomic Layer Deposition
ALD Al2O3 on Nanocellulose Substrates – Tailoring Barrier and Wetting Properties for Food Packaging
BREAK
AF1-WeA
A Framework Bridging Generative AI Models and Atomic Layer Deposition for HfxZr1-xO2
Quantitative Kinetic Monte Carlo Modeling of Al₂O₃ Atomic Layer Deposition by Trimethylaluminum Based on Neural-Network-Potential-Derived Kinetics
Analysis and Design of Nb PE-ALD using Neural Network Potential Molecular Dynamics Simulation
Study of Pd Ald as a Growth Enhancer for Ultrathin CoW Liner/Barrier Layer ALD
Design and Performance of AI Agents Based on Large Language Models Interfacing with an Autonomous Atomic Layer Deposition Tool
Generalized Reaction Networks for Atomic Layer Deposition
Active-Learning PES Exploration: Fast Reaction Discovery in ALD Chemistry
in-Silico, High-Throughput Exploration of Ald Reaction Mechanisms
BREAK
AF2-WeA
Validation of the Direct Simulation Monte Carlo Method for the Numerical Modelling of ALD Conformality
Multi-Scale Model for Optimization of HfO2 ALD in High Aspect Ratio Structures
Engineering the Interlayer Materials to Improve Interfacial Thermal Conductance
Closing Remarks and Award Presentations
AM1-WeA
Advanced Batch Atomic Layer Deposition Technology for Future 3D Device
On-Demand Precursor Delivery for Atomic Layer Deposition Using Machine Learning-Based Feedforward Control of Piezoelectric Valves
Design and Flow Optimization of Additively Manufactured Manifolds for Process/Purge Valves in Atomic Layer Deposition
Stability of MoCl5 in Heated Canisters and During Delivery
Precursor-Driven Morphology Tuning in ZnO Grown by ALD on 8-Inch Wafers
Novel Method to Quantify High Surface Area Microloading Effects on Film Conformality
High–Aspect–Ratio Integrations: A Path to Full Conformality from HfCl4 and Select Oxidizers
BREAK
AM2-WeA
Development and Validation of MoCl5 Delivery Simulations: From Canister to Deposition Chamber
Achieving Digital Twin in ALD by Combining AI, Computational Chemistry and Experimental Data
Process Window Engineering for Void-Free STI Gap Filling Using Integrated PEALD and Virtual DOE
Closing Remarks and Award Presentations in HB Plant Ballroom
Sessions | Time Periods | Topics | Schedule Overview