ALD/ALE 2026 Wednesday Morning

Atomic Layer Deposition in Conventional and Emerging DRAM Devices

Sacrificial Atomic Layer Deposition for Nanostructured Chalcogenide Materials

Enhancing Dielectric Properties of ALD Al-Doped HfO₂ Films for Memory Applications: The Role of Homogeneous Aluminum Distribution

Germanium Doping for Electrical Modulation of Ferroelectric HZO Using Atomic Layer Deposition

Design of Interface Formation Process for Superior Ferroelectricity and Enhanced Fatigue Resistance in Hf_xZr_1−xO₂-Based Ferroelectric Devices

Low-Temperature ALD HfO₂ for Magneto-Ionic Applications

High-mobility Atomically Ordered IGZO Transistors Deposited by Thermal Atomic-Layer-Deposition

Upper-Layer-Induced Crystallization of Metastable Rutile TiO₂

Surface-Reaction-Energetics-Driven Stabilization of Rutile TiO₂ at Low Temperatures in Atomic Layer Deposition

Magnetism of Ultrathin TiO₂ Films Prepared by Atomic Layer Deposition

Low-Temperature Peald of Silicon Nitride Using Diiodosilane for High-Conformality Spacers of Three-Dimensional Memory Devices

A Nanolaminate Cushion Approach for Stabilizing Ultrathin Al₂O₃ and SiO₂ Dielectrics in Future Logic and Memory Technologies

Understanding Temporal Behavior of Adsorption and Desorption in ALD via Multiple Injections of Precursor

Improved Atomic Layer Deposition of Ultra-Thin HfO₂ Dielectrics on Transition Metal Dichalcogenide Surfaces via Low Impact Plasma Pretreatments

Comparing HfO₂ Thin Films Grown by Low-temperature Thermal and Plasma ALD for Neuromorphic Functionality

Germanium Oxide with Tunable Composition Using Low-Temperature PEALD

Low Temperature Thermal Atomic Layer Deposition of Bismuth Oxide Thin Films Using a Novel Precursor

Effect of Initial Surface Silanol Density and Aminosilane Structure on O2 Plasma-Assisted ALD of SiO₂

Limits of Plasma Oxidation in Cr₂O₃ Ald: Over-Oxidation, Etching, and Defect Control

Composition-Tunable Molybdenum Carbonitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition (PEALD) for Diffusion Barriers in Cu and Ru Interconnects

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Crystalline Gan Thin Films Using Monovalent Organogallium Precursor

Plasma-Enhanced Growth of Low-κ Amorphous Boron Nitride: From 25 °C to 400 °C

Comparing the Effect of H₂ and N₂ Plasma on Boron Nitride Surface During Plasma Enhanced Atomic Layer Deposition Using Density Functional Theory

Precise and Narrow Ion-Energy Distributions in Plasma-Enhanced ALD of Nitrides Using Tailored-Waveform Biasing

Characterizing Inductively Coupled Plasmas in Ar/N₂/H₂ Mixtures for Plasma Enhanced Atomic Layer Deposition

ALD Outstanding Presentation Award Finalist: Triazolylidene Small Molecule Inhibitor for Area-Selective Atomic Layer Deposition of High k-Dielectric Materials

Maintaining Healthy Boundaries – Machine Learning Design of SMIs

Role of Precursor and Aklanethiol Chain Length on Area Selective Deposition of Aluminum and Hafnium-Containing Films

Surface Blocking Effect of NH₃ in Selective Co-ALD with CCTBA Precursor

Fluorination Passivation for Area-Selective Deposition: Selective Passivation of SiO₂ vs SiN_x for Highly Selective TiO₂ Deposition using Water-Free TiCl₄/Ti(ⁱPrO)₄.

Chemical Selectivity in Atomic Layer Selectivity (ALD) via Gas-Phase Silylation using N-(trimethylsilyl)dimethylamine (TMSDMA)

Mechanistic Criteria for Area Selective Deposition of Multicomponent Al_xSi_yO Oxide Dielectrics 

Perfect Selectivity vs Practical Sustainability in ASD

Photoassisted Chemical Vapor Deposition as a Strategy for Area Selective Deposition of Ru:Implications for Developing an ALD Process

Highly Selective Ru Growth on Metallic Substrates against Dielectric Surface via Inherent Area-selective Atomic Layer Deposition Using a Novel Ru Precursor

Mechanistic Insights into Area-Selective Etching of Ruthenium 

Platinum Growth on Li-Based Thin Films Using Thermal ALD

The Stability Study of ITO Film Deposited by Thermal Atomic Layer Deposition

Atomic Layer Deposition of TiN layer in Interposer Chip for Superconducting Quantum Processor Unit

Achieving Ultra-Low Resistivity in TiN Thin Films via Supercycle PEALD: The Critical Role of Ti:N Stoichiometry over Impurity Content

Characterization of Superconducting Niobium Nitride Thin Films Grown by Thermal Atomic Layer Deposition

Let There Be Light: Photo-Assisted ALD of Pt Using Pt(acac)₂ and O₃

Microwave Enhanced Atomic Layer Deposition (MW-ALD) of Ta2O5

Electron-Enhanced Atomic Layer Deposition of Tunable TiCxNy Ternary Nitride Films Using Tetrakis(dimethylamido)titanium with Ammonia Reactive Background Gas

Pulsed Excimer Laser Processing to Promote Room-Temperature Crystallization of ALD HfO₂ Films

Thermally Activated Atomic Layer Annealing (ALA): A Plasma Free Approach to Densification of Hafnia Thin Films