ASD 2026 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, March 30, 2026
1:30 PM 2:30 PM 3:30 PM 4:30 PM
ASD1-MoA
Atomic-Level Healing and Sculpting: The New Frontier of Area-Selective Deposition in Memory Fabrication
Establishing High-Temperature Area-Selective Deposition Process of SiN through Controlled Surface Fluorination
Selective Deposition of HfO2 Films
GeTe Thickness Profile Alteration by Proximity Effects During Area-Selective Atomic Layer Deposition in Nanotrenches
Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors in High Aspect Ratios Structures
Area-Selective Molecular Layer Deposition of Polyamide on EUV Resists versus Si-Based Underlayers for 300 mm Wafer Processing
BREAK
ASD2-MoA
Development of Area-Selective ALD Processes Using In Situ Optical Diagnostics
Characterization of Thin and Selective Film Depositions on v-Groove ASD Test Structures
Co-optimized Process and Metrology Accelerates Molybdenum Contact Development
Hydrogenolysis of Aniline on Transition Metal Surfaces: Effects of Temperature and Electronic Structure
Organic Functionalization of H-terminated Si Surfaces to Inhibit Atomic Layer Deposition of Al2O3
Adsorption Behavior of ALD Precursors on Si, SiO2 and SiN: Simulation and Experimental Investigation
Sessions | Time Periods | Topics | Schedule Overview