ASD 2026 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Tuesday, March 31, 2026 | |||||||||||||||
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| 8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||||||
| ASD1-TuM |
Versatile Strategies for ASD Optimization Using Super-Cycles
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Self-Aligned Patterning by Area-Selective Etching of Polymers and Area-Selective Atomic Layer Deposition: Decreasing Polymer Flow and Activating Noncatalytic Surface
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Leveraging Topographic Etch Selectivity: Atomic Layer Etch Pitch Splitting (Aps™)
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Phase and Surface Facet Dependent Etching of High-k Oxides for Selective Atomic Layer Etching
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Enabling Bottom-up Gap Fill and Selective Metal Deposition via NH3 Plasma-based AS-ALD
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Perfect Selectivity vs Practical Sustainability in ASD
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BREAK
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| ASD2-TuM |
Selective Heterogeneous Integration of TMDs via Single-Source Spin-on Chemistry
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Self-Aligned Lateral MoS2-TiS2 Heterostructures via Area-Selective ALD of TiS2 on CVD MoS2
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Laser-Activated Area-Selective Atomic and Molecular Layer Deposition on 2D Materials
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Acetic Acid-Modulated Al2O3 Atomic Layer Deposition on Monolayer MoS2 for Controlled Nucleation
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Aluminum Precursor Impact on Selectivity for Dielectric on Metal Selective Deposition
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Area-Selective Atomic Layer Deposition of Al2O3 Film Using Bulky Al Precursor AlMe2(iPr-AMD)
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