Physical Limits on Nanoelectronics

Interconnections for Devices and Circuits and Packages of the 21st Century Challenges in Materials, Processing, and Characterization

Fabrication in the Sub-100nm Regime

Technology Challenges: A Silicon Device and Integration Perspective

Toward Giga-scale Si Integrated Circuits

Generalized Ellipsometric Characterization of Cubic and Hexagonal Boron Nitride Thin Films Deposited by Magnetron Sputtering on [100]-Si

A Five Layer Stack of Nitride, Oxide, and Amorphous Silicon on Glass, Analyzed with Spectroscopic Ellipsometry

Comparison of Ellipsometry Measurements of ZrO\sub 2\ Films Deposited on Fused Silica Substrates in a Round-Robin Experiment, Part 2

Thin Film Characterization by Spectroscopic Ellipsometry: Overcoming the Data Analysis Challenge

Analysis of Plasma-Enhanced CVD Diamond Film Growth Processes from CO/H\sub 2\ and CH\sub 4\/H\sub 2\ Mixtures using Real Time Spectroellipsometry

Optical Properties of a Mixed-Metal Oxide Film, Co\sub 3\(Cr,Fe)\sub 3-x\O\sub 4\, Deposited by Spray Pyrolysis

Extended-range FTIR-ATR Si Surface Spectroscopy using a Novel Ge Prism with an Epitaxial Si Overlayer

In Situ Characterization of Thin Films by Differential Reflectance Spectroscopy: Nucleation and Growth of Silver Films on TiO\sub 2\(110) Surfaces