AVS2015 ThM Sessions , Thursday, October 22, 2015 8:00 AM
Thursday Morning
Abstract Timeline | Time Periods | Topics | Schedule Overview
Click a Session Code to view its Abstracts
| Session Code | Topic | Session Name |
|---|---|---|
| 2D+EM+MG+NS+SE+SM+SS+TF-ThM | 2D | Emergent 2D Materials |
| AC+AS+MI-ThM | AC | Nuclear Power and Waste Remediation |
| AM+EM+MS+TF-ThM | AM | Technologies Enabled by Additive Manufacturing/Future of Additive Manufacturing |
| AS-ThM | AS | Practical Surface Analysis III: Multiple-technique Problem-solving and Structure-property Correlations |
| EL+EM+EN-ThM | EL | Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches |
| EM+MS-ThM | EM | III-N Nitrides for Optoelectronic Applications |
| EM-ThM | EM | Interconnects II |
| HI+AS+SS+NS-ThM | HI | Focused Ion Beam Technology (08:00-10:00)/Fundamentals of Helium Ion Microscopy (11:00-12:20) |
| MN-ThM | MN | Atomic Layer Nanostructures and 2D NEMS |
| NS+MN-ThM | NS | Nanopatterning and Nanolithography/Nanoscale Mechanics |
| PS+2D-ThM | PS | Plasma Processing for 2D Materials |
| SD+AS+EM-ThM | SD | Fundamentals of Selective Deposition |
| SM+AS+BI+PS-ThM | SM | Plasma Processing of Biomaterials |
| SP+AS+NS+SS-ThM | SP | Probing Chemical Reactions at the Nanoscale |
| SS+AS+EM+EN-ThM | SS | Semiconductor Surfaces and Interfaces - I |
| TF+AS+NS+SA-ThM | TF | Thin Film: Growth and Characterization, Optical and Synchrotron Characterization I |
| TF+EM+NS+PS+SM-ThM | TF | Plasma ALD and Nano-applications |
| TR+TF-ThM | TR | Nanolubricants and Coatings |