AVS 71 Monday Morning

Inspection of Next Generation EUV Resists with NP-SIMS

Diffusion Study of Sodium in Hard Carbon Anode Active Materials Using a Novel in Situ ToF-SIMS Approach

Investigating Ionic Motion in Memristors via Topographically Corrected ToF-SIMS

Standardless, Semi-quantitative ToF-SIMS using the Full Spectrum Method (FSM)

AVS Medard Welch Award Talk: High Resolution Molecular Imaging by Mass Spectrometry – The OrbiSIMS Odyssey

ASSD Peter Sherwood Award Talk: In situ Detection of Proteins, Xenobiotics and Metabolomics via OrbiSIMS

Delineating Spatial Cellular Complexities Using Multi-omics Approach by GCIB-SIMS

Arsenic Quantification in SiGe: Advancing Accuracy with Orbitrap™-SIMS

Determine Protein Conformation and Orientation at Buried Solid/Liquid Interfaces in Situ

Cryo-XPS Characterisation and Solution Realism for Functional Nanoparticle Analysis

GCIB-SIMS in the study of Lymphoma

Optical Dynamics of Electrochemically Driven Reflectin Protein Films

How Swelling Affects Microscale Wetting and Friction of Soft Interfaces

Stability of Semi-Conducting Oxides Under Photocatalytic and Hydrogen Evolving Conditions

PFAS-Protein Interactions: Effects of Perfluorooctanoate on the Structure and Function of Cytochrome C

Confirmation of Jarzynski's Equality Based on Single Molecular and Macroscopic Interaction Force Measurements

Influence of Surface Structural and Electronic Properties on Antibacterial Action of Nano- and Microcrystalline Fe:ZnO

Molecular Insights into the Influence of Tail Architecture on Self-Assembly of Peptide-Polymer Amphiphile

Advancing Semiconductor Manufacturing: The Need for a Metrology Hub in North Texas

Template Matching Approach for Automated Determination of Crystal Phase and Orientation of Grains in 4D-STEM Precession Electron Diffraction Data for Hafnium Zirconium Oxide Ferroelectric Thin Films

Multi-Wavelength Atom Probe Tomography

Metrology for Validated Mass Transport Models of Vapor Phase Deposition Processes

Measuring Thermal Conductivity, Interfacial Thermal Conductance, and Chemical Composition at the Nanoscale with AFM Probes

Overview of research at the Center for Heterogeneous Integration Research in Packaging (CHIRP) Center

Digital Twins and the SRC MAPT2 Chapter on Digital Twins and Applications

Digital Twins Meet Materials Science: Real-Time AI Analysis for Advanced Manufacturing

Design, Construction, and Performance of a Dilution Refrigerator-Based Esrspm System with Cryogenic Switches

Magnetic Coupling in Graphene Nanoribbon Quantum Dots and Looking Beyond

Direct Observation of Mg Diffusion Through Screw-type Dislocations in a GaN Device Using Atom Probe Tomography

Focused Ion Beam Low Energy Implantation

Silicon-Containing Poly(Phthalaldehyde) Hard Mask Materials for Simplified High-Resolution and Grayscale Patterning via Thermal Scanning Probe Lithography (t-SPL) - A NanoFrazor Use Case

Tunable Electronic Properties Within Highly Unoccupied Electronic Bands of Graphene-SiC Heterostructures Determined by Scanning Tunneling Spectroscopy

Fabricating Color Centers using Liquid Metal Alloy Ion Source Focused Ion Beams

Atomic-scale Vibrational Excitations at Amorphous/Crystalline Interfaces

Revealing Quantum Functionality of Topological Thin Films by in situ Characterization with Materials Cluster System

Atomically Precise vertical Tunnel Field Effect Transistor (vTFET) for 10X Microelectronics Energy Efficiency in a General Purpose Transistor

Microwave-Assisted Direct Upcycling of Lithium Ion Battery Cathodes

Current Status and Future Perspectives of Plasma-Induced Damage and its Characterization

Direct Etching of Ru Pattern with Space Width of 10 nm and Less

Study of Electron-Surface Interactions for Etching of Ruthenium with Chlorine and Oxygen

Challenges and Perspectives in Process Control for Next Generation Devices

Highly Selective Isotropic etching of SiGe over Si via Pulsed RF Power in NF₃ Plasma

Extreme Etch Selectivity of SiN/SiO₂ in CF₄ Plasma with a DC-biased Grid for High Precision GAAFET Etching

Influence of Nitrogen on Controlling the Etch Selectivity between Tungsten Metal and Dielectric Materials

Plasma Etch of Low-K Dielectric (SiOC, SiOCN) at Reduced Temperature

Etch Characteristics of Flexible Low-k SiCOH Thin Films Under Fluorocarbon-Based Plasmas Using Inductively Coupled Plasma-Reactive Ion Etching Process

Enhancing 24nm Pitch Line / Space by DSA Rectification: A Path to Smoother Lines and Car Extension

Dry Etch Challenges Towards the High NA EUV Lithography Patterning Era

Strongly Anharmonic Gatemon Devices on Proximitized InAs 2DEG

Quantum Keynote Lecture

Stable Cnot-Gate on Inductively-Coupled Fluxoniums with Over 99.9% Fidelity – Part 1

Stable CNOT-gate on Inductively-coupled Fluxoniums with over 99.9% Fidelity – part 2

Silicon-Based Quantum Processors

Superconducting Qubits at MIT Lincoln Laboratory

Voltage Tunable MBE-grown Ge/SiGe Josephson Junctions for Gatemon Qubits

An Even-Odd Superconducting Diode Effect in Topological Insulator Josephson Junctions

Post-processing of Josephson Junctions for Precision Tuning of Qubit Frequencies 

Probing the Nonlinearities of Nb-Doped a-Si Josephson Junctions with Microwave Intermodulation Spectroscopy and Large-Signal Network Analysis

Reduced Oxide Epitaxy at Very High Temperatures

High Entropy Oxide Epitaxial Thin Films via Far-from-Equilibrium Synthesis

Multilayer Fluoride Thin Film Coatings for Ultraviolet Mirrors and Polarizers

Enhancing Atomic Layer Deposition Reactor Efficiency for Iridium Thin Films: Balancing Sustainability and Performance in Film Growth

Tailoring Ba-Based Thin Films for Security Imaging: Role of H₂O Reactivity and Al₂O₃ Supercycle Integration in ALD

ALD with Alternative Co-Reactants: Which Work, Which Do Not, and Why

Mapping Nanoscale Polarity Using Scanning Nanobeam Electron Diffraction Techniques

Data Science Tools to Disentangle Large Electron Diffraction Datasets of Thin Films

A Novel Approach to Study EUV and BEUV Photoresist Sensitivity through Real-time μXPS

Stoichiometric Determination in Thin Films: A Study of BaTiO₃